Asymmetric biasing for subgrid pattern adjustmentWONG, Alfred K; LIEBMANN, Lars W.SPIE proceedings series. 2001, pp 1548-1553, isbn 0-8194-4032-9, 2VolConference Paper

Development of a Novel EUV Mask Protection Engineering Tool and Mask Handling TechniquesAMEMIYA, Mitsuaki; OTA, Kazuya; KAMONO, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 66073G.1-66073G.8, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Impact of EUV light scatter on CD control as a result of mask density changesKRAUTSCHIK, Christof; ITO, Masaaki; NISHIYAMA, Iwao et al.SPIE proceedings series. 2002, pp 289-301, isbn 0-8194-4434-0, 2VolConference Paper

Environmental data from the Engineering Test StandKLEBANOFF, L. E; GRUNOW, P. A; GRAHAM, S et al.SPIE proceedings series. 2002, pp 310-315, isbn 0-8194-4434-0, 2VolConference Paper

Optics ContaminationBAJT, Sasa.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 227-259, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 33 p.Book Chapter

EUV lithographyBakshi, Vivek.SPIE Press Monograph. 2009, Vol 178, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, xxvii, 673 p, isbn 978-0-8194-6964-9 978-0-4704-7155-5Book

EUV Source TechnologyBAKSHI, Vivek.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 103-131, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 29 p.Book Chapter

Specification, Fabrication, Testing, and Mounting of EUVL Optical SubstratesTAYLOR, John S; SOUFLI, Regina.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 161-185, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 25 p.Book Chapter

Fundamentals of EUVL ScannersOTA, Kazuya.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 493-513, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 21 p.Book Chapter

The first full-field EUV masks ready for printingMICKAN, Uwe; GROENEVELD, Rogier; DEMARTEAU, Marcel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 628105.1-628105.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

L'optique en ligne de mire = Optics in the line of sightFERRARI, Thierry.Technologies internationales (Strasbourg). 2005, Num 119, pp 27-30, issn 1165-8568, 4 p.Article

Characterization and characteristics of a ULE®Glass tailored for the EUVL needsHRDINA, Kenneth E; HANSON, Benjamin Z; FENN, Philip M et al.SPIE proceedings series. 2002, pp 454-461, isbn 0-8194-4434-0, 2VolConference Paper

Approaches to rapid resist spreading on dispensing based UV-NILUSUKI, Kazuyuki; WAKAMATSU, Satoshi; OOMATSU, Tadashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700S.1-79700S.8Conference Paper

Development of lighting panel comprising light tube fabricated by LIGA processSAWA, Yoshitaka; TANAKA, Takanori; KITADANI, Takeshi et al.Microsystem technologies. 2008, Vol 14, Num 9-11, pp 1559-1565, issn 0946-7076, 7 p.Conference Paper

Correction technique of EBM-6000 prepared for EUV mask writingYOSHITAKE, Shusuke; SUNAOSHI, Hitoshi; YASHIMA, Jun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673030.1-673030.11, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Target fabrication of low-density and nanoporous materials to generate extreme ultraviolet (EUV)NAGAI, K; GU, Q.-C; HASHIMOTO, K et al.Journal de physique. IV. 2006, Vol 133, pp 875-880, issn 1155-4339, 6 p.Conference Paper

Advances in resist technology and processing XXII (San Jose CA, 28 February - 2 March 2005)Sturtevant, John L.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, XLIII, 1216 p, isbn 0-8194-5733-7Conference Proceedings

EUV lithography: Main challengesBANINE, V; BENSCHOP, J.SPIE proceedings series. 2004, pp 1-7, isbn 0-8194-5324-2, 7 p.Conference Paper

Fabrication of printed circuit board using UV exposureFAISAL, A. H. M; ZAHID HASAN MAHMOOD; ULLAH, S. M et al.SPIE proceedings series. 2002, pp 649-651, isbn 0-8194-4500-2, 2VolConference Paper

Inspection of EUV reticlesPETTIBONE, Donald; VELDMAN, Andrei; WALKER, David M et al.SPIE proceedings series. 2002, pp 363-374, isbn 0-8194-4434-0, 2VolConference Paper

Damage-free mask repair using electron beam induced chemical reactionsLIANG, Ted; STIVERS, Alan.SPIE proceedings series. 2002, pp 375-384, isbn 0-8194-4434-0, 2VolConference Paper

Novel design of Att-PSM structure for extreme ultra violet lithography and enhancement of image contrast during inspectionHAN, Sang-In; WASSON, James R; MANGAT, Pawitter J. S et al.SPIE proceedings series. 2002, pp 481-494, isbn 0-8194-4434-0, 2VolConference Paper

At-wavelength inspection of defect smoothing in EUVL masksMOONSUK YI; MINCHEOL PARK; MIRKARIMI, Paul et al.SPIE proceedings series. 2002, pp 395-400, isbn 0-8194-4434-0, 2VolConference Paper

Extreme ultraviolet (EUV) lithography II (28 February - 3 March 2011, San Jose CA US)La Fontaine, Bruno M; Naulleau, Patrick P.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 2 vol, 2, isbn 978-0-8194-8528-1Conference Proceedings

EUV Lithography : An Historical PerspectiveKINOSHITA, Hiroo; WOOD, Obert.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 1-54, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 54 p.Book Chapter